Chemical Mechanical Polishing Slurry – One-stop Solution

Chemical mechanical polishing is a key process for achieving global uniformity and flatness of wafers in the IC manufacturing process, and chemical mechanical polishing solutions are the main chemical materials used in the chemical mechanical polishing process. To account for various types of objects to polish, Anji chemical mechanical polishing slurries cover copper slurries, barrier slurries, dielectric (silica-based and ceria-based abrasive particles) slurries, tungsten slurries, slurries for various substrates, functional wet chemicals, and polishing slurries for new materials and new processes. Currently, Anji copper and the barrier layer series of chemical mechanical slurries can satisfy the demands of chip manufacturers in China and have achieved breakthroughs in overseas markets. Other related chemical mechanical polishing slurries are supplied to numerous chip manufacturers in China and abroad, whose specific production scale will be adapted to the needs of clients.

CMP SLURRIES

Chemical Mechanical Polishing Slurry – One-stop Solution

Chemical mechanical polishing is a key process for achieving global uniformity and flatness of wafers in the IC manufacturing process, and chemical mechanical polishing solutions are the main chemical materials used in the chemical mechanical polishing process. To account for various types of objects to polish, Anji chemical mechanical polishing slurries cover copper slurries, barrier slurries, dielectric (silica-based and ceria-based abrasive particles) slurries, tungsten slurries, slurries for various substrates, functional wet chemicals, and polishing slurries for new materials and new processes. Currently, Anji copper and the barrier layer series of chemical mechanical slurries can satisfy the demands of chip manufacturers in China and have achieved breakthroughs in overseas markets. Other related chemical mechanical polishing slurries are supplied to numerous chip manufacturers in China and abroad, whose specific production scale will be adapted to the needs of clients.

Functional Wet Electronic Chemicals – The advancement of Technology

Functional wet electronic chemicals are formulated to achieve special functions through formulation technology and to meet special process requirements in manufacturing. Anji offers post etches cleaning slurries, post etch residue removers, photoresist strippers for wafer level packaging, and other related products, among which, post CMP cleaning slurries, post etch residue removers, post polishing cleaning slurries have been widely used in the manufacture of integrated circuits on 8-inch and 12-inch wafers.

FUNCTIONAL WET ELECTRONIC CHEMICALS

Functional Wet Electronic Chemicals – The advancement of Technology

Functional wet electronic chemicals are formulated to achieve special functions through formulation technology and to meet special process requirements in manufacturing. Anji offers post etches cleaning slurries, post etch residue removers, photoresist strippers for wafer level packaging, and other related products, among which, post CMP cleaning slurries, post etch residue removers, post polishing cleaning slurries have been widely used in the manufacture of integrated circuits on 8-inch and 12-inch wafers.